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• W2039874342 abstract "The corrosion behaviors of single layer TiN, CrN, TiAlN and multilayer TiAlN/CrN coatings, deposited on steel substrate using a multi-target reactive direct current magnetron sputtering process, were studied in 3.5% NaCl solution by potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The total thickness of the coatings was about 1.5 μm. About 0.5 μm thick chromium interlayer was used for improved adhesion of the coatings. The potentiodynamic polarization measurements showed that for all the coatings the corrosion potential shifted to higher values as compared to the uncoated substrate. Similarly, the corrosion current density decreased for coated samples, indicating better corrosion resistance of the coated samples. The multilayer coatings of TiAlN/CrN exhibited superior corrosion behavior as compared to the single layer coatings. The Nyquist and the Bode plots obtained from the EIS measurements were fitted by appropriate equivalent circuits to calculate the pore resistance, the charge transfer resistance and the capacitance. These studies revealed that the pore resistance was lowest for TiN coatings, which increased for TiAlN coatings. TiAlN/CrN multilayer coatings exhibited highest pore resistance. No significant change in the capacitive behavior of the coatings was observed, suggesting minimal morphological changes as a result of immersion in the electrolyte. This could be attributed to shorter immersion durations. These studies were confirmed by examining the corroded samples under scanning electron microscope. Preliminary experiments conducted with additional interlayer of electroless nickel (5.0 μm thick) have shown significant improvement in the corrosion resistance of the coatings." @default.
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• W2039874342 date "2006-08-01" @default.
• W2039874342 modified "2023-09-25" @default.
• W2039874342 title "Electrochemical behavior of single layer CrN, TiN, TiAlN coatings and nanolayered TiAlN/CrN multilayer coatings prepared by reactive direct current magnetron sputtering" @default.
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• W2039874342 doi "https://doi.org/10.1016/j.tsf.2006.03.008" @default.
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