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• W2039968704 abstract "Films of Al, Al 2 O 3 , Mo and MoSi x were formed by ion beam assisted deposition (IBAD) at R ratios between 0.004 and 0.1 and film thicknesses between 150 and 1100 nm. Al films were crystalline with a strong (111) fiber texture becoming more pronounced and azimuthally oriented with increasing R ratio. Mo films were crystalline with strong (110) texture and a distinct azimuthal texture indicative of planar channeling of the ion beam along (110)_planes. The microstructure of Al films is characterized by large columnar grains at R = 0 with breakup starting at R = 0 04, while that of Mo films showed little change with increasing R ratio. Al 2 O 3 and MoSi x films are amorphous under all deposition conditions. The average stress in oxide and silicide films is tensile at R = 0 and becomes compressive with increased values of the normalized energy, saturating at ∼ 15 eV/atom. The average stress in Mo films is tensile at R = 0, increases to a maximum value of 0.63 GPa and becomes compressive with increasing normalized energy." @default.
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• W2039968704 date "1993-01-01" @default.
• W2039968704 modified "2023-10-16" @default.
• W2039968704 title "Synthesis and properties of microlaminate structures by ion beam assisted deposition" @default.
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• W2039968704 doi "https://doi.org/10.1016/0168-583x(93)90798-b" @default.
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