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- W2040152431 abstract "We have simulated transient enhanced diffusion (TED) of boron in the presence of dislocations produced by amorphizing implantation. A unified simulation was done, taking into account that end-of-range (EOR) dislocations act as both a sink for and source of self-interstitials, depending on temperature and annealing time. We have simulated B TED profiles both in regrown regions and beneath EOR dislocations produced by Si implantation at room temperature. Simulation results indicate that EOR dislocations do not act as a perfect barrier to self-interstitial diffusion. In addition, the simulation well reproduces the experimental profiles by taking into account another type of defect that maintain self-interstitial concentration at thermal equilibrium values in the regrown region." @default.
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- W2040152431 date "1998-11-01" @default.
- W2040152431 modified "2023-09-24" @default.
- W2040152431 title "Transient Enhanced Diffusion of Boron in the Presence of Dislocations Produced by Amorphizing Implantation in Silicon" @default.
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- W2040152431 doi "https://doi.org/10.1143/jjap.37.5866" @default.
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