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- W2040377965 abstract "The external proton beam of the Tandem accelerator of the Research Centre in Rossendorf/Germany was used to carry out non-destructive particle-induced X-ray emission (PIXE) particle-induced gamma-ray emission (PIGE) and Rutherford backscattering (RBS) measurements simultaneously on Art Nouveau artifacts produced around 1900 by Tiffany/USA and Loetz/Austria. These studies should proof the technology of producing an iridescent layer on a glass surface. By means of the yield ratio Y(Si-K)/Y(Si-γ) of both characteristic X-radiation (Si-K) and γ-radiation (Si-γ) of the element silicon it could be shown that a thin top layer is present on the glass surface due to the treatment of the heated artifacts (about 500°C) with an alcoholic solution of SnCl2 [1]. Combined evaluation of the PIXE and RBS spectra resulted in a thickness of 20–300 nm for this top layer. In addition, a transition region between the iridescent layer and the bulk glass was obtained by RUMP simulations. Approximately 80% of the total amount of the Sn were found to be present in this transition layer and only 10–20% in the outermost surface region. XPS studies showed that the outermost layer consists of SnO2. The formation of other Sn compounds in the outermost near-surface region based on Sn–Si–O during the manufacturing process can be excluded." @default.
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- W2040377965 date "2001-07-01" @default.
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- W2040377965 title "Iridescent Art Nouveau glass – IBA and XPS for the characterisation of thin iridescent layers" @default.
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- W2040377965 doi "https://doi.org/10.1016/s0168-583x(01)00598-5" @default.
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