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- W2040414272 abstract "Abstract The modeling approach (multiscale) linking the different scales encountered in simulating industrial growth processes from the vapor phase of interest for the silicon based microelectronics is here addressed. The final aim is linking the materials and devices performances to the operational parameters of the production techniques. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2040414272 date "2005-09-26" @default.
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- W2040414272 title "Multiscale simulation of silicon film growth" @default.
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- W2040414272 doi "https://doi.org/10.1002/crat.200410467" @default.
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