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- W2040457611 abstract "We have modified the Schottky-barrer height of Si overlayers on Ag(111) substrates by means of Cs intralayers of different thicknesses. We also found a correlation between these changes and those of the work function, which makes it possible to measure the true value of the S parameter." @default.
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- W2040457611 date "1992-07-15" @default.
- W2040457611 modified "2023-10-14" @default.
- W2040457611 title "Microscopic Schottky-barrier control: Semiconductor-on-metal case" @default.
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- W2040457611 doi "https://doi.org/10.1103/physrevb.46.1835" @default.
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