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- W2040573604 abstract "Recently reported experiments in which the deep-UV (193-nm) and VUV (157-nm) output of an excimer laser has been applied to submicrometer patterning are reviewed. New methods have been designed to take advantage of the short-wavelength, high-peak-intensity pulsed radiation from these sources. The examples of patterning of crystalline diamond and diamond-like carbon films are discussed. Lines and spaces of 0.13 μm have been obtained using diamond-like hard carbon films as self-developing resists." @default.
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- W2040573604 date "1986-08-20" @default.
- W2040573604 modified "2023-09-23" @default.
- W2040573604 title "Excimer Laser Projection Patterning With And Without Resists: Submicrometer Etching Of Diamond And Diamond-Like Carbon Resist" @default.
- W2040573604 doi "https://doi.org/10.1117/12.963702" @default.
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