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• W2040603590 abstract "A W interlayer process is demonstrated for fabrication of a through-pore nanoporous anodic aluminum oxide (AAO) scaffold on gold substrates. The W interlayer process comprises anodization of an trilayer for the formation of an AAO scaffold with a extrusion at the pore bottom and selective removal of the to expose the surface of the substrate, without modifying the nanostructure of the scaffold. Structural and kinetic studies of the extrusion formation revealed that the anodization of W consumes a fixed thickness of the W layer in acidic electrolytes and that the thickness depends strongly on the anodic voltage. Based on this study, the optimum thickness of a W interlayer in the trilayer was determined for various anodization conditions. Through-pore AAOs were fabricated on Au substrates using optimum W thicknesses (10 and ) in sulfuric acid at , oxalic acid at , and phosphoric acid at , without a violent evolution reaction and without changing the pore diameter. With the resulting AAO scaffolds, vertically aligned freestanding Au and Pt nanowires with diameters ranging from about to about were grown by electrodeposition on a Au substrate. The methodology demonstrated here should be generally applicable to other inert metallic substrates/underlayers." @default.
• W2040603590 created "2016-06-24" @default.
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• W2040603590 date "2011-01-01" @default.
• W2040603590 modified "2023-10-16" @default.
• W2040603590 title "A Tungsten Interlayer Process for Fabrication of Through-Pore AAO Scaffolds on Gold Substrates" @default.
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• W2040603590 doi "https://doi.org/10.1149/1.3514606" @default.
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