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• W2040654083 startingPage "1331" @default.
• W2040654083 abstract "A comprehensive study of $ensuremath{simeq}2.5--10ensuremath{-}mathrm{MeV}$ electron-irradiated Czochralski Si has been conducted using positron lifetime and Doppler broadening spectroscopies. Eight samples, ranging from heavily doped $n$ type to heavily doped $p$ type, were irradiated simultaneously at room temperature to facilitate quantitative comparisons between the samples. The influence from the oxygen impurity was also investigated by comparison with oxygen-free Si. For lightly doped materials (dopant concentration less than $5ifmmodetimeselsetexttimesfi{}{10}^{16}/{mathrm{cm}}^{3})$ the irradiation damage is dominated by free, and negatively charged divacancies for the dose employed in this work $(1.2ifmmodetimeselsetexttimesfi{}{10}^{18}{e}^{ensuremath{-}}/{mathrm{cm}}^{2}).$ For the heavily doped materials (dopant concentrations larger than $5ifmmodetimeselsetexttimesfi{}{10}^{17}/{mathrm{cm}}^{3})$ vacancy-dopant complexes dominate, some of which involve divacancies, and in these samples very high introduction rates $(1--4{mathrm{cm}}^{mathrm{ensuremath{-}}1})$ are estimated. In heavily B-doped materials evidence is found for thermally activated trapping by boron divacancy complexes. Association of divacancies with P, Sb, and B dopants was found to modify significantly the Doppler $S$ parameter relative to the value for free divacancies." @default.
• W2040654083 created "2016-06-24" @default.
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• W2040654083 date "1998-07-15" @default.
• W2040654083 modified "2023-09-26" @default.
• W2040654083 title "Impurity-vacancy complexes in electron-irradiated silicon" @default.
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• W2040654083 doi "https://doi.org/10.1103/physrevb.58.1331" @default.
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