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• W2040696036 abstract "This paper shows results on structural and magnetotransport measurements for reactively sputtered amorphous oxide films (Co55Fe20Hf25)1 − xOx with x ⩽ 0.35 and their layered structures. A strong x-dependency was found to be related to microstructural changes caused by oxygen-induced chemical phase separation. For low x, Co–Co(Fe) pair-correlated atom clusters dominate and the films are soft ferromagnetic with excellent uniaxial magnetic anisotropy. Small coercivity Hc ≈ 1–4 Oe, enhanced magnetisation Ms ≈ 420 emu/cm3 and low resistivity ρ ≈ 10− 4 Ωcm were measured for these films, showing a good potential for application in magnetoelectronics. For large x, however, since Hf-O pair-correlated atom clusters are dominant, the films become granular-like superparamagnetic with a saturation field Hs>20 kOe and a remanence Mr/Ms ≈ 0. ρ is extremely high presumably due to Coulomb blockade effect. A large magnetoresistance was observed, being 30% (70 kOe) at 5 K and 10% at room temperature. This effect can be attributed to spin-dependent tunnelling among lateral separated Co-Co(Fe) clusters. The layered structure shows a small, but low-field magnetotunnelling effect." @default.
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• W2040696036 date "2006-02-01" @default.
• W2040696036 modified "2023-09-26" @default.
• W2040696036 title "Magnetoresistance in amorphous oxide films CoFeHfO" @default.
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• W2040696036 doi "https://doi.org/10.1209/epl/i2005-10402-x" @default.
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