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- W2040763844 abstract "Digital-micromirror device (DMD)-based maskless lithography technique has been applied to fabricate microoptical elements (MOEs). Due to the binary pulse-width modulation in DMD, however, some ruled corrugations will appear on the aerial image of MOEs when a laser light is used as exposure source. In this paper, the forming mechanism of the corrugations is explored and simulated annealing algorithm is adopted to remove the corrugations. The experimental results demonstrate that DMD-based maskless lithography technique is an effective tool for the fabrication of MOEs." @default.
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- W2040763844 date "2010-05-01" @default.
- W2040763844 modified "2023-09-27" @default.
- W2040763844 title "Improving the imaging quality of MOEs in DMD-based maskless lithography" @default.
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- W2040763844 doi "https://doi.org/10.1016/j.mee.2009.11.055" @default.
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