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• W2040774890 abstract "Cu–W alloy films were prepared by magnetron sputtering. Their microstructure, hardness, elastic modulus and plastic deformation were investigated by various technologies. The results show that Cu–W amorphous alloy films are formed in the composition range from Cu36W64 to Cu75W25, and out of this range solid solutions are formed. Both the hardness and elastic modulus of Cu–W amorphous alloy films are lower than their rule-of-mixture values. The load–displacement curves of Cu–W amorphous alloys with lower Cu content exhibit obvious serrated flow at lower strain rate. Serrations are suppressed at higher strain rate and higher Cu content. For all Cu–W amorphous alloy films, shear bands are observed and their number and density increase with increasing Cu content, indicating that the details of the plastic deformation of Cu–W amorphous alloys are material-related." @default.
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• W2040774890 date "2008-09-01" @default.
• W2040774890 modified "2023-09-23" @default.
• W2040774890 title "Nanoindentation studies of Cu–W alloy films prepared by magnetron sputtering" @default.
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• W2040774890 doi "https://doi.org/10.1016/j.jallcom.2007.10.033" @default.
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