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- W2040897718 abstract "In this work a-Si:H/c-Si heterostructures with the electronic properties of a-Si:H were prepared by 55 kHz plasma enhanced chemical vapor deposition high-rate deposition technique. Current–voltage and capacitance–voltage properties of a-Si:H/c-Si heterostructure were measured to investigate the effects of low frequency plasma on the growing film and amorphous silicon/crystalline silicon boundary. It was established that the interface state density is low enough for device applications (<1.3·1011 cm−2) and decreases with an increase of low frequency power. The charge carrier transport mechanism in a-Si/c-Si heterostructure was analyzed." @default.
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- W2040897718 date "1998-05-01" @default.
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- W2040897718 title "a-Si:H/c-Si heterostructures prepared by 55 kHz glow discharge high-rate deposition technique" @default.
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- W2040897718 doi "https://doi.org/10.1016/s0022-3093(98)00289-0" @default.
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