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• W2041036350 abstract "YBa2Cu3O7−x films have been deposited on MgO by reactive, off-axis magnetron sputtering in an argon, oxygen, and hydrogen gas mixture. The material and electrical properties of the films were studied for deposition temperatures from 600 to 760 °C. The films, all approximately 300 nm thick, were predominantly a-axis oriented when deposited at or below 620 °C but were c-axis oriented when deposited at temperatures above 640 °C. The surfaces of films deposited between 640 and 710 °C were partially covered with a-axis grains. Surface roughness measurements indicated the smoothest films occurred for deposition temperatures below 680 °C. Resistance ratios as great as 3.1 were observed for some films. Transition temperatures exceeded 89 K and resistivities at 100 K were less than 150 μΩ cm for the best films. Low-temperature critical current densities exceeded 107 A/cm2 for films deposited from 640 to 720 °C. The temperature dependence of the critical current density near the transition temperature had a power law dependence of nearly 3/2 for deposition temperatures below 690 °C. The power law dependence decreased for increasing deposition temperatures, dropping to nearly 1.1 in the film deposited at 750 °C." @default.
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• W2041036350 date "1993-12-01" @default.
• W2041036350 modified "2023-09-26" @default.
• W2041036350 title "Morphology and transport of YBa2Cu3O7−xsputtered in argon, oxygen, and hydrogen: Dependence on deposition temperature" @default.
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• W2041036350 doi "https://doi.org/10.1063/1.355077" @default.
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