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- W2041274920 abstract "Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB)." @default.
- W2041274920 created "2016-06-24" @default.
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- W2041274920 date "2002-09-02" @default.
- W2041274920 modified "2023-09-22" @default.
- W2041274920 title "Fabrication of silica-on-silicon waveguide devices by PECVD" @default.
- W2041274920 doi "https://doi.org/10.1117/12.481243" @default.
- W2041274920 hasPublicationYear "2002" @default.
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