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• W2041335850 abstract "The interface-state formation caused by a negative gate bias in a polycrystalline silicon gate-oxide-semiconductor capacitor versus injecting temperature in the range of 77–400 K is studied. It is found that this interface-state generation is temperature independent in this range of temperatures, which indicates that the motion of the mobile species (as the hydrogen-related species) through the SiO2 toward the Si/SiO2 interface seems unlikely. One assumes that this no thermal activation agrees with the break of Si—Si or Si—O distorted bonds at the Si/SiO2 interface caused by injecting hot electrons during stress." @default.
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• W2041335850 date "1993-12-13" @default.
• W2041335850 modified "2023-09-27" @default.
• W2041335850 title "Study of the interface‐state formation at different temperatures" @default.
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• W2041335850 doi "https://doi.org/10.1063/1.110163" @default.
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