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- W2041345067 abstract "Abstract Epitaxial chromium dioxide (CrO 2 ) thin films have been deposited by low pressure chemical vapor deposition (LPCVD) on (100) TiO 2 substrates using the precursor chromium hexacarbonyl (Cr(CO) 6 ) within a narrow temperature window of 380–400 °C. Normal θ –2 θ Bragg x-ray diffraction results show that the predominant phase is CrO 2 with only a small amount of Cr 2 O 3 present, mostly at the film surface. The LPCVD films have a reasonably smooth surface morphology with a root mean square roughness of 4 nm on a scale of 5 μm. Raman spectroscopy confirms the existence of rutile CrO 2 in the deposited films, while transmission electron microscopy confirms the single-crystalline nature of the films. The LPCVD films showing a dominant CrO 2 phase exhibit clear uniaxial magnetic anisotropy with the easy axis oriented along the c direction." @default.
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- W2041345067 date "2010-09-01" @default.
- W2041345067 modified "2023-09-25" @default.
- W2041345067 title "Epitaxial film growth of chromium dioxide by low pressure chemical vapor deposition using chromium carbonyl" @default.
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- W2041345067 doi "https://doi.org/10.1016/j.tsf.2010.07.001" @default.
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