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- W2041374180 abstract "This paper reports a newly developed fabrication process for monolithic integration of thermally stable InAlAs/InGaAs/InP E/D-HEMTs based on Ir-gate and Ag-ohmic contact technologies. The Ir-gate and Ag-ohmic contacts were annealed simultaneously after passivation using a SiNx layer. Both integrated E/D-HEMTs with gate-length of 0.2 mum demonstrated excellent DC and RF characteristics" @default.
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- W2041374180 date "2006-12-01" @default.
- W2041374180 modified "2023-10-14" @default.
- W2041374180 title "Monolithic integration of thermally stable enhancement-mode and depletion-mode InAlAs/InGaAs/InP HEMTs utilizing Ir-gate and Ag-ohmic contact technologies" @default.
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- W2041374180 doi "https://doi.org/10.1109/iedm.2006.346855" @default.
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