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• W2041452511 abstract "Patterning of sub-30 nm features using high resolution nano-imprint lithography (NIL) requires use of quartztemplates. To this end, various fabrication methods such as e-beam lithography, edge lithography, and focused ion beamlithography were employed for the template formation. Despite significant advances using these methods, NILtemplate formation process suffers from low throughput and high cost of fabrication when compared with the fabricationof masks used in optical lithography. This is largely owing to a 4X difference in feature sizes involved for thefabrication of NIL template and optical lithography mask. In this paper, we report on a simple, cost-effective method forthe fabrication of sub-30 nm NIL templates. Typical fabrication-time required for the formation of sub-30 nm HPtemplates using conventional Gaussian beam electron beam lithography, runs into several days. Additionally, complicatedetch procedures must be employed for pattern transfer onto quartz substrates. Here we propose a low cost, simplifiedfabrication process for the formation of high resolution NIL templates using wafer pattern replication. We fabricated sub-30nmHP poly-silicon lines and spaces on silicon wafer using multiple patterning technique. These patterns were subsequentlytransferred onto quartz substrates using NIL technique.Several types of features were studied to realize a template using the triple patterning technique described above. Results of wafer printing using the said template will be discussed." @default.
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• W2041452511 date "2010-03-11" @default.
• W2041452511 modified "2023-09-27" @default.
• W2041452511 title "Nanoimprint template fabrication using wafer pattern for sub-30nm" @default.
• W2041452511 doi "https://doi.org/10.1117/12.846481" @default.
• W2041452511 hasPublicationYear "2010" @default.
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