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- W2041550842 abstract "Abstract Hydrogenated amorphous silicon (a-Si:H) was prepared by low power plasma-enhanced chemical vapor deposition on Dow corning 7059 glass plates at 100–300 °C. The a-Si:H films were treated in a solution of 2.5% KOH:97.5% H2O at 70 °C, oxygen atmosphere, and microwave hydrogen plasma. The intensity of photoluminescence for the a-Si:H films by the 488 nm excitation increased by removing a surface layer of about 60 nm in KOH solution, and that for the a-Si:H films treated in oxygen atmosphere was below the detection limit. The two treatments did not show remarkable peak shifts on the photoluminescence spectrum. However, the microwave hydrogen plasma irradiation to the a-Si:H films showed the visible-shift of the peak wavelength of photoluminescence with a large increase in emission intensity." @default.
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- W2041550842 date "1999-04-01" @default.
- W2041550842 modified "2023-09-27" @default.
- W2041550842 title "Luminescence from hydrogenated amorphous silicon treated in microwave hydrogen plasma, KOH solution, and oxygen atmosphere" @default.
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