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• W2041663138 abstract "Two original electromechanical magnetic sensors have been developed using a fully industrial fabrication process that relies on bulk wet etching of CMOS dies. The first device uses the Lorentz force to actuate a U-shaped cantilever beam, while piezoresistive polysilicon gauges convert the beam bending into an electrical signal. A 2 μT sensor resolution is demonstrated, making this device suitable for earth magnetic field measurement. The second prospective device uses a ferromagnetic material deposited on top of a free standing mechanical frame. Such approach leads to the design of a passive sensor that does not require any electrical power for actuation." @default.
• W2041663138 created "2016-06-24" @default.
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• W2041663138 date "2003-01-01" @default.
• W2041663138 modified "2023-10-01" @default.
• W2041663138 title "Monolithic piezoresistive CMOS magnetic field sensors" @default.
• W2041663138 cites W2014467377 @default.
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• W2041663138 doi "https://doi.org/10.1016/s0924-4247(02)00317-5" @default.
• W2041663138 hasPublicationYear "2003" @default.
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