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- W2041882684 abstract "Luminescence spectra and intensities of type I to type IV silicas, excited with a 1 keV electron beam, were measured. Luminescence was measured on type III silica samples implanted with hydrogen or helium ions in a dose range of 1016–1017/cm2 with energies in the range of 35–160 keV. Under electron excitation, luminescence bands were observed at 2.75 eV in all samples and bands at 1.9 and 2.2 eV in some samples. The initial luminescent intensities at 2.75 eV were proportional to the beam current in the range of 0.8–12.7 μA/mm2 and inversely related to the SiOH contents in some silicas and H+ implanted silicas. A model is proposed that the transient change of the emission intensities is due to a competition reaction between luminescence center creation and a reaction that diminishes the intensities." @default.
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- W2041882684 date "1996-03-01" @default.
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- W2041882684 title "The effect of ion implantation on luminescence of a silica" @default.
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- W2041882684 doi "https://doi.org/10.1016/0022-3093(95)00559-5" @default.
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