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• W2042106715 endingPage "575" @default.
• W2042106715 startingPage "568" @default.
• W2042106715 abstract "A cesium sputter ion source has been used to generate novel cluster and monoatomic primary ion beams for secondary ion mass spectrometry (SIMS). The source produces a variety of primary ion beam species with sufficient flux to be usable for both organic surface analysis and semiconductor depth profiling. The primary focus of this work is on the generation and use of carbon and carbon-containing cluster primary ion beams for SIMS. Stability of the sputter ion source is a few percent over 20 min, has useful lifetimes of weeks to months, and produces total primary ion beam currents for C2− ions, measured at the sample, of &gt;1 μA at an extraction voltage of 10 kV. Larger cluster ions (Cx−x=4–10 and CsCx−x=2–8) are produced with tens of nA of beam current. Due to the divergence of the source, focused beam operation gives current densities under optimal conditions of 0.4–0.5 mA/cm2. Cluster bombardment studies of organic films using carbon clusters Cx−x=1–10 indicate that large enhancements (up to a factor of 800) in the secondary ion yield for characteristic molecular ions from organic samples can be obtained with the larger cluster ions. The signal enhancement can also be utilized in microfocus operation of the source for organic secondary ion imaging studies. For favorable organic samples, cluster bombardment with Cx−, x&gt;6 shows little evidence of degradation of the sample from the accumulation of primary beam-induced damage. This effect can be potentially utilized for depth profiling of organic thin films and for further enhancements in sensitivity for organic SIMS analysis. Depth profiling of low energy As implants in silicon with the CsC6− primary ion demonstrates that as much as a factor of 6 improvement in apparent depth resolution can be obtained compared to profiles obtained under standard conditions using Cs+ bombardment. The flexibility of the source to produce monoatomic primary ion beams from virtually any target material is also being exploited to prepare low energy in situ ion implant standards for quantitative SIMS analysis." @default.
• W2042106715 created "2016-06-24" @default.
• W2042106715 creator A5031271433 @default.
• W2042106715 creator A5034192079 @default.
• W2042106715 creator A5040266305 @default.
• W2042106715 creator A5040739883 @default.
• W2042106715 creator A5041881381 @default.
• W2042106715 creator A5051468768 @default.
• W2042106715 date "2001-03-01" @default.
• W2042106715 modified "2023-10-15" @default.
• W2042106715 title "Negative cesium sputter ion source for generating cluster primary ion beams for secondary ion mass spectrometry analysis" @default.
• W2042106715 cites W1969864100 @default.
• W2042106715 cites W1980843703 @default.
• W2042106715 cites W1998140338 @default.
• W2042106715 cites W2029921929 @default.
• W2042106715 cites W2039189022 @default.
• W2042106715 cites W2044656573 @default.
• W2042106715 cites W2056841143 @default.
• W2042106715 cites W2063859595 @default.
• W2042106715 cites W2083172035 @default.
• W2042106715 cites W2084586980 @default.
• W2042106715 cites W2133289332 @default.
• W2042106715 doi "https://doi.org/10.1116/1.1340651" @default.
• W2042106715 hasPublicationYear "2001" @default.
• W2042106715 type Work @default.
• W2042106715 sameAs 2042106715 @default.
• W2042106715 citedByCount "62" @default.
• W2042106715 countsByYear W20421067152012 @default.
• W2042106715 countsByYear W20421067152013 @default.
• W2042106715 countsByYear W20421067152014 @default.
• W2042106715 countsByYear W20421067152015 @default.
• W2042106715 countsByYear W20421067152016 @default.
• W2042106715 countsByYear W20421067152018 @default.
• W2042106715 countsByYear W20421067152021 @default.
• W2042106715 countsByYear W20421067152022 @default.
• W2042106715 crossrefType "journal-article" @default.
• W2042106715 hasAuthorship W2042106715A5031271433 @default.
• W2042106715 hasAuthorship W2042106715A5034192079 @default.
• W2042106715 hasAuthorship W2042106715A5040266305 @default.
• W2042106715 hasAuthorship W2042106715A5040739883 @default.
• W2042106715 hasAuthorship W2042106715A5041881381 @default.
• W2042106715 hasAuthorship W2042106715A5051468768 @default.
• W2042106715 hasBestOaLocation W20421067151 @default.
• W2042106715 hasConcept C107920040 @default.
• W2042106715 hasConcept C113196181 @default.
• W2042106715 hasConcept C121332964 @default.
• W2042106715 hasConcept C145148216 @default.
• W2042106715 hasConcept C152149077 @default.
• W2042106715 hasConcept C162356407 @default.
• W2042106715 hasConcept C171250308 @default.
• W2042106715 hasConcept C178790620 @default.
• W2042106715 hasConcept C179104552 @default.
• W2042106715 hasConcept C184779094 @default.
• W2042106715 hasConcept C185592680 @default.
• W2042106715 hasConcept C187529661 @default.
• W2042106715 hasConcept C188224857 @default.
• W2042106715 hasConcept C19067145 @default.
• W2042106715 hasConcept C192562407 @default.
• W2042106715 hasConcept C22423302 @default.
• W2042106715 hasConcept C43617362 @default.
• W2042106715 hasConcept C50774322 @default.
• W2042106715 hasConcept C519659679 @default.
• W2042106715 hasConcept C77671233 @default.
• W2042106715 hasConcept C79176676 @default.
• W2042106715 hasConcept C93106096 @default.
• W2042106715 hasConceptScore W2042106715C107920040 @default.
• W2042106715 hasConceptScore W2042106715C113196181 @default.
• W2042106715 hasConceptScore W2042106715C121332964 @default.
• W2042106715 hasConceptScore W2042106715C145148216 @default.
• W2042106715 hasConceptScore W2042106715C152149077 @default.
• W2042106715 hasConceptScore W2042106715C162356407 @default.
• W2042106715 hasConceptScore W2042106715C171250308 @default.
• W2042106715 hasConceptScore W2042106715C178790620 @default.
• W2042106715 hasConceptScore W2042106715C179104552 @default.
• W2042106715 hasConceptScore W2042106715C184779094 @default.
• W2042106715 hasConceptScore W2042106715C185592680 @default.
• W2042106715 hasConceptScore W2042106715C187529661 @default.
• W2042106715 hasConceptScore W2042106715C188224857 @default.
• W2042106715 hasConceptScore W2042106715C19067145 @default.
• W2042106715 hasConceptScore W2042106715C192562407 @default.
• W2042106715 hasConceptScore W2042106715C22423302 @default.
• W2042106715 hasConceptScore W2042106715C43617362 @default.
• W2042106715 hasConceptScore W2042106715C50774322 @default.
• W2042106715 hasConceptScore W2042106715C519659679 @default.
• W2042106715 hasConceptScore W2042106715C77671233 @default.
• W2042106715 hasConceptScore W2042106715C79176676 @default.
• W2042106715 hasConceptScore W2042106715C93106096 @default.
• W2042106715 hasIssue "2" @default.
• W2042106715 hasLocation W20421067151 @default.
• W2042106715 hasOpenAccess W2042106715 @default.
• W2042106715 hasPrimaryLocation W20421067151 @default.
• W2042106715 hasRelatedWork W1239185118 @default.
• W2042106715 hasRelatedWork W1978936450 @default.
• W2042106715 hasRelatedWork W1993156593 @default.
• W2042106715 hasRelatedWork W2004648794 @default.
• W2042106715 hasRelatedWork W2013592421 @default.
• W2042106715 hasRelatedWork W2027205690 @default.
• W2042106715 hasRelatedWork W2070372698 @default.

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