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- W2042149040 abstract "Micrometer scale features are fabricated on Si (100) surfaces using lithographic techniques and thermally processed in an ultrahigh vacuum (UHV) environment. The process results in the formation of symmetric, step-terrace patterns with wide atomically flat regions exhibiting highly reproducible step-terrace morphology. The patterns spontaneously transform into a symmetric formation marked by step bunches separated by wide atomic terraces as a result of extended high temperature processing. A Monte Carlo model is introduced to understand the step flow and bunching process. The lithographic patterns remain visible post processing using a conventional optical microscope. The resulting patterns have the important property that they can be used as fiducial marks to externally locate nanoscale features fabricated on the large atomically flat terraces." @default.
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- W2042149040 date "2011-07-01" @default.
- W2042149040 modified "2023-10-16" @default.
- W2042149040 title "Controlled formation of atomic step morphology on micropatterned Si (100)" @default.
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- W2042149040 doi "https://doi.org/10.1116/1.3610955" @default.
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