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• W2042157495 abstract "The paper reports on a new system for plasma nitriding combined with a hollow cathode discharge sputtering at high pressures (about 1000 Pa), a new way of producing duplex coatings, and on a low-pressure (0.1–0.3 Pa) plasma nitriding using microwave discharges. It has been shown that an addition of an auxiliary cathode into a conventional high-pressure nitriding system can improve properties of the nitrided surfaces by incorporation of the elements sputtered from the auxiliary cathode. A converse duplex coating technique consisting of plasma nitriding or vacuum heat treatment of pre-coated substrates has been successfully tested for the protection of aluminium. It has been shown that a low-alloy steel nitriding can be effective not only inside the low-pressure electron cyclotron resonance discharges, i.e. for a standard distance of the substrate from an output of the plasma source, d=250 mm, but also outside these discharges, i.e. for a large distance d=750 mm." @default.
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• W2042157495 date "2000-12-01" @default.
• W2042157495 modified "2023-09-23" @default.
• W2042157495 title "Recent progress in plasma nitriding" @default.
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• W2042157495 doi "https://doi.org/10.1016/s0042-207x(00)00404-8" @default.
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