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- W2042172311 abstract "The radiation of a diode laser was used for studying the plasma in a microwave boosted glow discharge source. In this source sample atoms are produced by cathode sputtering and excited in a low pressure microwave induced plasma (MIP) in argon. The plasma was investigated by laser absorption directing the beam of a semiconductor diode laser through the plasma perpendicular to the axis of the source at two different places. Two transitions in neutral argon with wavelengths in the near infrared spectral region (810.60 nm and 811.76 nm) have been studied. From the recorded absorption line profiles of Gaussian shape, the gas temperatures and the concentration of excited argon atoms in the microwave boosted glow discharge, as well as in the non-boosted discharge, have been calculated. The gas temperatures were found to be in the range 320–520 K, depending on the conditions; the metastable state densities in the range 1 × 1011–1.4 × 1012cm−3." @default.
- W2042172311 created "2016-06-24" @default.
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- W2042172311 date "1992-07-01" @default.
- W2042172311 modified "2023-10-11" @default.
- W2042172311 title "Measurement of gas temperatures and metastable state densities in a microwave boosted glow discharge using a diode laser" @default.
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- W2042172311 doi "https://doi.org/10.1016/0584-8547(92)80082-r" @default.
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