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• W2042287263 abstract "Although the theory of high-angle elastic scattering of fast electrons is well developed, accurate calculation of the incident-energy threshold and cross section for surface-atom sputtering is hampered by uncertainties in the value of the surface-displacement energy E d and its angular dependence. We show that reasonable agreement with experiment is achieved by assuming a non-spherical escape potential with E d =(5/3) E sub , where E sub is the sublimation energy. Since field-emission sources and aberration-corrected TEM lenses have become more widespread, sputtering has begun to impose a practical limit to the spatial resolution of microanalysis for some specimens. Sputtering can be delayed by coating the specimen with a thin layer of carbon, or prevented by reducing the incident energy; 60 keV should be sufficiently low for most materials." @default.
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• W2042287263 date "2010-07-01" @default.
• W2042287263 modified "2023-10-10" @default.
• W2042287263 title "Basic questions related to electron-induced sputtering in the TEM" @default.
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• W2042287263 doi "https://doi.org/10.1016/j.ultramic.2009.11.003" @default.
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