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- W2042447601 abstract "In order to respond to the constant demand for more productivity in the manufacture of IC devices, higher throughputand higher resolution are fundamental requirements for each new generation of exposure tools. However, meeting bothrequirements lead to unwanted aberration we refer to as In our experience, the problem of thethermal aberrations does not correlated only to the duration of heavy use. It depends very strongly on both the opticalsettings and the mask patterns, also even on the specific interaction between the two. So, even if using the sameillumination configurations, there is a possibility to observe different distribution of thermal aberrations. In this paper,we define and investigate various to be used as targets for thermal aberrations compensation. These areidentified as the weak patterns of the thermal aberration. We assess several cases of thermal aberrations, and showhow the optimized compensation for each is determined and then applied on the actual exposure tools." @default.
- W2042447601 created "2016-06-24" @default.
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- W2042447601 date "2008-03-14" @default.
- W2042447601 modified "2023-10-18" @default.
- W2042447601 title "Thermal aberration control in projection lens" @default.
- W2042447601 doi "https://doi.org/10.1117/12.772586" @default.
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