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• W2042631159 abstract "Without pretreatment, the adherence of polycrystalline chemical vapour deposition (CVD) diamond films on WC–Co substrates is rather poor due to Co presence in the binder phase. Therefore several attempts to immobilize the Co on the substrate surface have already been investigated. However, results are not fully satisfying. In this paper, solutions or suspensions of various Al compounds have been applied to the WC–Co surface to form stable Co/Al compounds before diamond deposition. By means of SIMS depth profile analysis it is shown that surface pretreatment with Al(OC 2 H 5 ) 3 /conc. CH 3 COOH or Al(NO 3 ) 3 leads to the formation of Co/Al compounds which suppress the Co mobility resulting in improved adherence of the diamond layer. Evidence for Co/Al compounds has also been found after pretreatment with Al(OH) 2 –OOCCH 3 in neutral solution, although the quality of the diamond crystals was changed to ballas. The use of Al(OH) 2 –OOCCH 3 in a basic as well as an acid medium produced no Co/Al reaction." @default.
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• W2042631159 date "1999-11-01" @default.
• W2042631159 modified "2023-09-27" @default.
• W2042631159 title "WC–Co substrate surface pretreatments with aluminum compounds prior to polycrystalline CVD diamond deposition" @default.
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• W2042631159 doi "https://doi.org/10.1016/s0263-4368(00)00003-2" @default.
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