Matches in SemOpenAlex for { <https://semopenalex.org/work/W2042881570> ?p ?o ?g. }
Showing items 1 to 79 of
79
with 100 items per page.
- W2042881570 abstract "The current state of the art g-line and i-line photolithography using conventional novolac based resists will be able to pattern 0.5-0.6micron devices adequately, however beyond 0.5micron, an alternative lithography will be required. KrF excimer laser lithography is one of the leading candidates for sub-half micron VLSI lithography. This technology will be able to take advantage of the higher resolution and wider depth of focus possible with the smaller wavelength. One of the major technical barriers for application of this technology to mass production is the low sensitivity of commercially available resists. New non-novolac based resist have been introduced with high sensitivity to meet this requirement. By using chemical means, Ito [1] was able to achieve quantum efficiencies much greater than one resulting in very sensitive resist systems. In this paper we describe our work to develop ASKA, Alkaline Soluble Kinetics using Acid Generator, positive resist. This resist has sensitivity greater than 25mJ/cm2 which is sufficient for a controllable manufacturing process. ASKA resist also has very good lithographic characteristics with resolution to 0.40micron and near vertical resist profiles. Process characterization of ASKA resist is also reported. Post exposure bake (PEB) is a critical step that controls performance of this resist. ASKA resist has excellent stability and linewidth control and is not dependent on the time between exposure and PEB. The resist has wide exposure latitude up to +-15% for 10% variation in linewidth. ASKA has mask linearity down to 0.40micron lines where at 0.35micron the linewidth begins to deviate from linearity. Depth of focus for 0.40micron lines is about +-1.0micron. Etch resistance is evaluated and reported for silicon dioxide, nitride and polysilicon layers. ASKA was successfully applied to actual device wafers. KrF excimer laser lithography using ASKA resist can fabricate sub-half micron patterns for 64M DRAM." @default.
- W2042881570 created "2016-06-24" @default.
- W2042881570 creator A5002187420 @default.
- W2042881570 creator A5008744337 @default.
- W2042881570 creator A5020011335 @default.
- W2042881570 creator A5044472026 @default.
- W2042881570 creator A5071127380 @default.
- W2042881570 creator A5083225988 @default.
- W2042881570 date "1990-01-01" @default.
- W2042881570 modified "2023-09-24" @default.
- W2042881570 title "Process compatibility using high sensitivity resist for KrF excimer laser lithography-ASKA." @default.
- W2042881570 doi "https://doi.org/10.2494/photopolymer.3.289" @default.
- W2042881570 hasPublicationYear "1990" @default.
- W2042881570 type Work @default.
- W2042881570 sameAs 2042881570 @default.
- W2042881570 citedByCount "1" @default.
- W2042881570 crossrefType "journal-article" @default.
- W2042881570 hasAuthorship W2042881570A5002187420 @default.
- W2042881570 hasAuthorship W2042881570A5008744337 @default.
- W2042881570 hasAuthorship W2042881570A5020011335 @default.
- W2042881570 hasAuthorship W2042881570A5044472026 @default.
- W2042881570 hasAuthorship W2042881570A5071127380 @default.
- W2042881570 hasAuthorship W2042881570A5083225988 @default.
- W2042881570 hasBestOaLocation W20428815701 @default.
- W2042881570 hasConcept C105487726 @default.
- W2042881570 hasConcept C120665830 @default.
- W2042881570 hasConcept C121332964 @default.
- W2042881570 hasConcept C142181693 @default.
- W2042881570 hasConcept C162996421 @default.
- W2042881570 hasConcept C171250308 @default.
- W2042881570 hasConcept C192562407 @default.
- W2042881570 hasConcept C200274948 @default.
- W2042881570 hasConcept C204223013 @default.
- W2042881570 hasConcept C2779227376 @default.
- W2042881570 hasConcept C2780477314 @default.
- W2042881570 hasConcept C49040817 @default.
- W2042881570 hasConcept C520434653 @default.
- W2042881570 hasConcept C53524968 @default.
- W2042881570 hasConceptScore W2042881570C105487726 @default.
- W2042881570 hasConceptScore W2042881570C120665830 @default.
- W2042881570 hasConceptScore W2042881570C121332964 @default.
- W2042881570 hasConceptScore W2042881570C142181693 @default.
- W2042881570 hasConceptScore W2042881570C162996421 @default.
- W2042881570 hasConceptScore W2042881570C171250308 @default.
- W2042881570 hasConceptScore W2042881570C192562407 @default.
- W2042881570 hasConceptScore W2042881570C200274948 @default.
- W2042881570 hasConceptScore W2042881570C204223013 @default.
- W2042881570 hasConceptScore W2042881570C2779227376 @default.
- W2042881570 hasConceptScore W2042881570C2780477314 @default.
- W2042881570 hasConceptScore W2042881570C49040817 @default.
- W2042881570 hasConceptScore W2042881570C520434653 @default.
- W2042881570 hasConceptScore W2042881570C53524968 @default.
- W2042881570 hasLocation W20428815701 @default.
- W2042881570 hasOpenAccess W2042881570 @default.
- W2042881570 hasPrimaryLocation W20428815701 @default.
- W2042881570 hasRelatedWork W1972660581 @default.
- W2042881570 hasRelatedWork W2008826099 @default.
- W2042881570 hasRelatedWork W2015196977 @default.
- W2042881570 hasRelatedWork W2017034776 @default.
- W2042881570 hasRelatedWork W2025221073 @default.
- W2042881570 hasRelatedWork W2026028626 @default.
- W2042881570 hasRelatedWork W2038128961 @default.
- W2042881570 hasRelatedWork W2052006280 @default.
- W2042881570 hasRelatedWork W2056492527 @default.
- W2042881570 hasRelatedWork W2057881805 @default.
- W2042881570 hasRelatedWork W2066136502 @default.
- W2042881570 hasRelatedWork W2074528267 @default.
- W2042881570 hasRelatedWork W2088715418 @default.
- W2042881570 hasRelatedWork W2516179283 @default.
- W2042881570 hasRelatedWork W2793599778 @default.
- W2042881570 hasRelatedWork W2897478698 @default.
- W2042881570 hasRelatedWork W3181180793 @default.
- W2042881570 hasRelatedWork W1966011975 @default.
- W2042881570 hasRelatedWork W1967868735 @default.
- W2042881570 hasRelatedWork W2509203117 @default.
- W2042881570 isParatext "false" @default.
- W2042881570 isRetracted "false" @default.
- W2042881570 magId "2042881570" @default.
- W2042881570 workType "article" @default.