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- W2042954310 abstract "Abstract The objective of the present paper is to provide current information on a novel and truly compact fast capillary discharge EUV source that is under investigation at GREMI. A current of a few kA having a fast rise time was applied across a xenon-filled alumina capillary to produce radiation, mostly in the EUV region (10–16 nm). The EUV radiation from the capillary was characterized by employing an EUV spectrometer and an EUV pinhole camera. Time-integrated and time-resolved spectra provided information about the radiative processes from the xenon plasma together with the wall of the capillary. A superfast pinching effect is inferred from the pinhole images. At present, this EUV source is capable of operating at a high repetition rate (350 Hz in burst mode and 100 Hz in continuous mode) without causing too much damage to the wall of the capillary. This EUV source may be a strong contender as the source of the Next Generation Lithography (NGL) assembly." @default.
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- W2042954310 date "2002-07-01" @default.
- W2042954310 modified "2023-09-24" @default.
- W2042954310 title "Recent progress in EUV source development at GREMI" @default.
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- W2042954310 doi "https://doi.org/10.1016/s0167-9317(02)00572-5" @default.
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