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- W2043221657 abstract "Abstract Films of Eu-doped GaN (GaN:Eu) were grown on c-plane of sapphire (c-Al 2 O 3 ), GaAs(1 0 0), Si(1 0 0) and glass substrates by RF magnetron sputtering method. The X-ray diffraction (XRD) measurement of the sputtered film was carried out. For GaN:Eu and undoped GaN, the lattice constants c and a of as-grown films were larger than those of the bulk GaN. After annealing, the lattice constants c and a of the films decreased." @default.
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- W2043221657 date "2008-12-01" @default.
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- W2043221657 title "Structural properties of Eu-doped GaN films prepared by RF magnetron sputtering" @default.
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- W2043221657 doi "https://doi.org/10.1016/j.tsf.2008.09.022" @default.
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