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- W2043222466 abstract "Mechanisms for damage nucleation in Si during heavy ion irradiation are discussed. The influence of dose rate on the accumulation of damage is shown to be dependent upon the mass of the implanted ions. For a constant fluence, it was found that damage increases with dose rate for all ions studied, although the effect was consistently smaller as the mass of the ion was increased. This systematic change is interpreted to indicate the increasing importance of cascade effects on damage nucleation as the mass of the ion is increased. However, the large influence of dose rate for lighter ions is an indication of a different mechanism for damage nucleation, one which does not depend on cascade effects and is more homogeneous in nature." @default.
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- W2043222466 date "1985-05-01" @default.
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- W2043222466 title "Dose rate effects in silicon during heavy ion irradiation" @default.
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- W2043222466 doi "https://doi.org/10.1016/0168-583x(85)90309-x" @default.
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