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• W2043441608 abstract "We study electronic transport within a lithographically defined silicon nanowire for zero and finite bias. The 10-nm wide and 500-nm long nanowire is fabricated by advanced electron-beam lithographic techniques. Transport experiments reveal clear quantum size effects in the conduction through the wire. Energy quantization within the wire leads to a shift in conduction threshold. Quantum interference effects cause an oscillatory pattern in the conductance. At low source-drain bias, transport is dominated by shallow tunneling barriers. At higher bias, additional nanowire modes are found to contribute to the conductance." @default.
• W2043441608 created "2016-06-24" @default.
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• W2043441608 date "2003-08-15" @default.
• W2043441608 modified "2023-10-16" @default.
• W2043441608 title "Quantum interference in a one-dimensional silicon nanowire" @default.
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• W2043441608 doi "https://doi.org/10.1103/physrevb.68.075311" @default.
• W2043441608 hasPublicationYear "2003" @default.
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