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- W2043515592 abstract "In the past years the usage of mixed oxides coatings lead to an important improvement of laser damage threshold and quality of optical elements. In this study influence of post treatment procedure - ex-situ annealing - is examined in terms of quality, optical constants and laser induced damage threshold (LIDT) of mixed HfO<sub>2</sub> and SiO<sub>2</sub> coatings. Monolayer thin films containing different fractions of HfO<sub>2</sub> are deposited with ion beam sputtering technology (IBS.) All samples are post annealed at different temperatures and optimal regimes are defined. Refractive index and absorption coefficient dispersion is evaluated from transmission spectra measurements. Surface roughness of all samples is characterized before and after deposition and annealing, using atomic force microscopy (AFM). Microstructural changes are identified from changes in surface topography. Further, optical resistance was characterized by 5.7 ns duration pulses for 355 nm wavelength laser radiation, performing 1-on-1 sample exposure tests with high resolution micro-focusing approach for monolayer samples and S-on-1 tests for multilayer reflectors. Morphology of damaged sites was analyzed through optical microscopy. Finally, conclusions about annealing effect for mixed HfO<sub>2</sub> and SiO<sub>2</sub> monolayer and multilayer coatings are made." @default.
- W2043515592 created "2016-06-24" @default.
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- W2043515592 date "2013-11-14" @default.
- W2043515592 modified "2023-09-23" @default.
- W2043515592 title "Characterization and application of HfO2- SiO2mixtures produced by ion-beam sputtering technology" @default.
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- W2043515592 doi "https://doi.org/10.1117/12.2030308" @default.
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