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- W2043955480 abstract "Abstract Titanium aluminide thin films have been deposited on quartz plates by DC magnetron sputtering with a solenoid coil. A round shaped Ti and Al complex disk was employed as a target. In our sputtering system, because the spatial position of plasma on the target surface can be controlled by the solenoid coil current, the in-depth concentration profile of Ti and Al can be controlled by changing the solenoid coil current. Highly oriented Ti 3 Al, TiAl and TiAl 3 films were synthesized from one complex Ti and Al target at 400°C by changing the solenoid coil current. Gradient composite film of these titanium aluminides could also be fabricated by changing the solenoid coil current." @default.
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- W2043955480 date "1998-03-01" @default.
- W2043955480 modified "2023-09-27" @default.
- W2043955480 title "Preparation of Ti–Al gradient composite films by sputtering" @default.
- W2043955480 cites W2016074881 @default.
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- W2043955480 doi "https://doi.org/10.1016/s0040-6090(98)00391-5" @default.
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