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- W2043975767 abstract "Pulsed IR laser-induced ablation of bulk poly[oxy(tetramethyldisilane-1,2-diyl)], [(CH3)2Si(CH3)2SiO]n,yields thin polyoxocarbosilane films whose polymeric structure consists of a backbone composed of −(CH3)2Si(CH3)2SiO− and −O(CH3)2SiO− units, which is cross-linked via SiSiC2O, C3SiO, C2SiHO, CSiHO2, and CSiO3 moieties. These laser-fabricated hybrides of siloxanes and polysilylenes are insoluble in organic solvents and thermally superior to siloxanes and polysilylenes, which makes them intriguing for applications in thermally exposed devices." @default.
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- W2043975767 date "2002-02-19" @default.
- W2043975767 modified "2023-10-16" @default.
- W2043975767 title "Thermally Stable Polyoxocarbosilane Thin Films by Pulsed IR Laser Ablation of Poly[oxy(tetramethyldisilane-1,2-diyl)]" @default.
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- W2043975767 doi "https://doi.org/10.1021/cm0112338" @default.
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