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- W2044100850 abstract "Thermodynamic equilibrium calculations have been performed for the Si-Ge-Cl-H system for both atmospheric and low pressure CVD of Si1-xGex under various conditions. The equilibrium compositions of the deposited layers and their dependence on temperature, pressure and chlorine-to-hydrogen ratio were determined. The calculation results show that the deposit composition tends to be enriched in the Ge component at low temperature, high pressure and large Cl/H. Two gas sources were examined. The equilibrium compositions were found to be less sensitive to growth parameters for SiH2Cl2+GeH4+H2 than for SiCl4+GeCl4+H2. Equilibrium deposition efficiencies have also been calculated as a function of the pressure and Ge concentration. The calculated and the experimental results show agreement in the high temperature range. At lower temperatures, a significant increase of growth rate with increasing Ge content experimentally observed by several authors, seems to be a kinetic auto-catalytic effect instead of a thermodynamic property." @default.
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- W2044100850 date "1992-01-01" @default.
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- W2044100850 title "Equilibrium thermodynamic analysis of the Si-Ge-Cl-H system for atmospheric and low pressure CVD of Si1-xGex" @default.
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