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- W2044119464 abstract "High-current Pd-ion implantation technique was employed to synthesize Pd germanide on Ge wafers, using a metal vapour vacuum arc (MEVVA) ion source. The implantation was conducted with an extracted voltage of 34 kV, beam current densities of 17.7 and 53 A and at a fixed dose of ions . It was found that implantation with a current density of 17.7 could directly synthesize the equilibrium PdGe phase on the Ge surface and that the formed germanide loosely dispersed on the surface. Interesting, in the case of implantation with the current density of 53 , the formed PdGe grains organized themselves in a fractal pattern with a dimension close to the percolation threshold of 1.90, and the sheet resistivity was therefore significantly reduced down to 59 . The formation of the PdGe phase as well as the percolation network under MEVVA implantation is also discussed." @default.
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- W2044119464 date "1999-01-01" @default.
- W2044119464 modified "2023-09-23" @default.
- W2044119464 title "Percolation network of PdGe phase formed on Ge surface by high-current Pd-ion implantation" @default.
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- W2044119464 doi "https://doi.org/10.1088/0953-8984/11/1/004" @default.
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