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- W2044156925 abstract "Nanocrystalline titanium nitride thin films have been deposited by reactive dc magnetron sputtering in pure N2, Ar–N2 and He–N2 gas mixtures. The influence of the nature of the sputtering gas on the structural, optical and the electronic properties of the nanocrystalline TiN films has been studied. Structural properties were investigated by using x-ray diffraction and an atomic force microscope, optical ones by using a UV–visible spectrophotometer and electronic properties by means of dc four-probe resistivity measurements. The films deposited in an He–N2 gas mixture exhibited a strong (111) texture, while for those deposited in an Ar–N2 mixture under identical conditions, the texture of the films changed from (111) to (200)." @default.
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- W2044156925 date "2005-11-07" @default.
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- W2044156925 title "Structural, optical and electronic properties of nanocrystalline TiN films" @default.
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- W2044156925 doi "https://doi.org/10.1088/0957-4484/16/12/054" @default.
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