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- W2044405757 abstract "A review of the photo-induced chemical vapour deposition (photo-CVD) processes yielding silicon oxide thin films that have emerged in the last decade is presented. Both lasers and UV lamps as photon sources are included. The basic principles, processing conditions, precursors, geometries, advantages and limitations of the various types of photo-CVD processes are described and compared. Their technological applicability and potential for industrial large-scale installation are discussed." @default.
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- W2044405757 date "1992-10-01" @default.
- W2044405757 modified "2023-10-15" @default.
- W2044405757 title "Photo-induced chemical vapour deposition of silicon oxide thin films" @default.
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- W2044405757 doi "https://doi.org/10.1016/0040-6090(92)90916-y" @default.
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