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- W2044431489 abstract "We report an experimental procedure to optimize the current profile of a focused ion beam probe, with a special emphasis on high resolution applications. The optimized operating conditions are given for three specific cases: specimen thinning for electron microscopy, nanoetching, and nanolithography. We present high quality membranes for transmission electron microscopy, arrays of nanoholes with reproducible dimensions of 17 nm etched on a nickel membrane, and finally nanolithography operations with a 10 nm resolution. Due to the conventional design of our focused ion beam system, the operating conditions that we have established for each nanofabrication application, should be successfully applied to a wide variety of ion columns." @default.
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- W2044431489 date "1997-11-01" @default.
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- W2044431489 title "Optimization of experimental operating parameters for very high resolution focused ion beam applications" @default.
- W2044431489 doi "https://doi.org/10.1116/1.589650" @default.
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