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- W2044476951 abstract "The Semiconductor Industry Association (SIA) has identified a fifteen year roadmap of lithography requirements for gigabit device generations and beyond. Several lithography methods have been identified to meet the projected overlay, critical dimension control, and defectivity targets. Error budgets are useful in determining the overall capability of a new technology based on sub-component performance. Baseline error budget models used by the SIA Lithography roadmap committee are presented to highlight critical technology improvement areas, with emphasis on current and future mask capabilities." @default.
- W2044476951 created "2016-06-24" @default.
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- W2044476951 date "1994-12-07" @default.
- W2044476951 modified "2023-09-25" @default.
- W2044476951 title "<title>Importance of mask technical specifications on the lithography error budget</title>" @default.
- W2044476951 doi "https://doi.org/10.1117/12.195839" @default.
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