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- W2044521629 abstract "The evolution of microstructure in Al and Cu thin film lines during electromigration has been studied using a transmission electron microscopy. Grain boundary migration was found to be critically involved in the electromigration induced hillock formation that can be described as a three-dimensional growth of a single grain." @default.
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- W2044521629 date "1995-03-06" @default.
- W2044521629 modified "2023-09-27" @default.
- W2044521629 title "Hillock formation during electromigration in Cu and Al thin films: Three‐dimensional grain growth" @default.
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- W2044521629 doi "https://doi.org/10.1063/1.113240" @default.
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