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• W2044631146 startingPage "856" @default.
• W2044631146 abstract "The composition and ultramicrohardness of thin films deposited by electron beam evaporation of aluminium, silicon and titanium, with a simultaneous 20 keV nitrogen ion bombardment, were investigated. The friction coefficient and wear resistance against steel were also measured. Only leqslant50% of the incident nitrogen ions were incorporated during deposition. Under our experimental conditions, titanium oxycarbonitride and aluminium-nitrogen films containing 10–20% oxide were formed. Silicon reacted to produce a relatively pure substoichiometric SiN x random bonding alloy, which showed excellent wear resistance. Titanium oxycarbonitride films exhibited low friction against steel and a hardnesses approaching that of bulk TiN." @default.
• W2044631146 created "2016-06-24" @default.
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• W2044631146 date "1987-06-01" @default.
• W2044631146 modified "2023-09-28" @default.
• W2044631146 title "Characterisation of Nitrides Prepared by Ion Beam Enhanced Deposition of Aluminium, Silicon and Titanium" @default.
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• W2044631146 doi "https://doi.org/10.1143/jjap.26.856" @default.
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