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• W2044646985 abstract "Inverted n-type modulated-doped Si/Si0.77Ge0.23 heterostructures have been prepared usingex-situ ion implantation of a virtual substrate for the doping followed by cleaning and the regrowth of the silicon quantum well in the growth system. At 1.7K sample mobilities of 1.5–7.3×104cm2/Vs and carrier densities of 4.25–14.51×1011cm−2 were obtained. The sample mobility was observed to decrease with increasing ion dose (and carrier density). Clear Shubnikov-de Haas oscillations and quantum Hall effect plateaux were visible, demonstrating the quality of the technique." @default.
• W2044646985 created "2016-06-24" @default.
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• W2044646985 date "2000-06-01" @default.
• W2044646985 modified "2023-09-25" @default.
• W2044646985 title "Inverted modulation-doped n-type Si/Si0.77Ge0.23 heterostructures" @default.
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• W2044646985 doi "https://doi.org/10.1016/s0167-9317(00)00297-5" @default.
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