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• W2044686306 abstract "Silicon carbonitride (SiCN) films were deposited by radio-frequency magnetron sputtering and then annealed at different temperatures from 1100to1300°C in hydrogen atmosphere. The as-deposited films and films annealed at 1100°C did not show photoluminescence (PL), whereas strong PL peaks appeared at 355 and 469nm after annealing at 1200 and 1300°C. X-ray diffraction, transmission electron microscope, and Fourier transform infrared spectrometer results show that the enhancement of PL properties is due to the change of microstructure and composition." @default.
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• W2044686306 date "2006-05-01" @default.
• W2044686306 modified "2023-10-03" @default.
• W2044686306 title "The evolution of microstructure and photoluminescence of SiCN films with annealing temperature" @default.
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• W2044686306 doi "https://doi.org/10.1063/1.2194208" @default.
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