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• W2044692844 abstract "An intermetallic titanium aluminide thinfilm was deposited on glass substrates by reactive thermal evaporation. The magnetic field was applied with substrate heating for directional growth of thin films. X-Ray diffraction and microhardness technique using Knoop indentation were used for characterization of the deposited films. The optical properties were measured using optical spectroscopy in the UV-Visible (200nm-700 nm) range. The electrical resistivities of the films were measured using two- probe method. A detailed investigation was carried out to examine the effect of various process parameters influencing the properties of the deposited film. A comparative study was done on the growth of Ti-Al on various substrates to extend the application areas of this material. The film cracking - threshold was observed during the time of aging the sample at a temperature of 870 °C." @default.
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• W2044692844 date "2014-01-01" @default.
• W2044692844 modified "2023-09-27" @default.
• W2044692844 title "Deposition of Ti-Al Intermetallic Composite by Reactive Thermal Evaporation" @default.
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• W2044692844 doi "https://doi.org/10.1016/j.mspro.2014.07.384" @default.
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