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- W2044806476 abstract "A novel technique for the measurement of the diffusion coefficient of oxygen vacancies in tin dioxide is presented. The method consists of a simple kinetic experiment which is conducted in a high-vacuum system. Samples of SnO2 thin films, prepared by r.f. sputtering, are heated in the vacuum system at200°C for several hours. A controlled amount of oxygen is then introduced within the system, and the change in conductivity is monitored as a function of time. The observed kinetics are explained by solving Fick's equations of diffusion in one dimension. From the results, a diffusion coefficient of 1.4 x 10-13cm2s-1 at 200°C is obtained. This is extended to a microscopic model for the jump frequencies of these vacancies in the semiconductor. The results are useful in assessing the stability of the material, and should be of interest in all fields of application of the oxide." @default.
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- W2044806476 date "1980-05-01" @default.
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- W2044806476 title "Oxygen vacancy diffusion in SnO<sub>2</sub>thin films" @default.
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- W2044806476 doi "https://doi.org/10.1080/00207218008901117" @default.
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