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- W2044873946 abstract "In a previous work [N. Hecking and E. te Kaat, Proc. EPM 87, Energy Pulse and Particle Beam Modification of Materials, ed. K. Hennig (Akademie-Verlag, Berlin, 1988) p. 164], self-irradiation of silicon at 210 K was studied in the energy range of 1–20 MeV. Depth distributions of damage were determined by optical reflectivity measurements on bevelled samples. It was shown, that TRIM-simulated depths of maximum nuclear stopping were about 10% lower than experimental results. Since the energy dependence of high-energy ion ranges is mainly determined by electronic energy loss, in this work the electronic stopping power of silicon ions is derived from damage measurements and Monte Carlo simulations. A fitting formula first employed for protons in silicon and also successfully applied for high-energy C and N ions is used to describe the electronic stopping power. The differences between experimental and TRIM-simulated depths mentioned above are obviously due to an overestimated electronic energy loss. Therefore TRIM-simulated projected ranges Rp for Si ions at MeV energies are also too small. Monte Carlo simulations with the electronic stopping power based on experimental results yield more accurate ranges at higher energies." @default.
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- W2044873946 date "1991-07-01" @default.
- W2044873946 modified "2023-10-01" @default.
- W2044873946 title "Ranges and electronic stopping powers of 1–20 MeV 28Si ions in Si targets as obtained from optical reflectivity measurements on bevelled samples" @default.
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- W2044873946 doi "https://doi.org/10.1016/0168-583x(91)95289-p" @default.
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